• Samples with many different geometries can be employed by a simple adaptation of the cover plate (hat-shape,disk-shaped, wafers, etc.).


• Electrical connection to reference base plate. In combination with Dodecon Universal Manipulator Sample Stage allows for reading of ion deposition/bombardment currents.


• Easy mounting and changing thanks to the modular design of the holder and the separation from the lower heating stage.

• The actual sample temperature can be precisely and locally measured by means of a thermocouple connected to the sample back (precision ~ 5 K).


• Temperature range: 5 – 1500 K (K-type themocouple). Others on request.


• For temperature readout the thermocouple (TC) contacts are connected by spring connectors in the Dodecon Universal Manipulator Sample Stage.

• An integrated heating stage comprising an electrically isolated tungsten filament allows both


• radiative heating (up to 500 K);


• e-beam bombardment heating (up to 1200 K).


• e-beam heating occurs by application of a negative high voltage (HV) to the filament (HV up to 1.2 kV, emission current up to 18 mA)


• e-beam heating particularly indicated for quick and high temperature sample annealing (flash annealing, e.g. for metal crystal preparation).


• Filament current and high voltage are applied through the power contacts, connected by spring contacts in the Dodecon Universal Manipulator Sample Stage.

• With LN2 down to 97 K (sample holder mounted on Dodecon Universal Manipulator Sample Stage).


• With LHe down to 40 K (sample holder mounted on Dodecon Universal Manipulator Head).

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